| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_6ac179bcbad17b8ea0260c65f201da92 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C30B30-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02002
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C30B15-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C30B15-305
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C30B29-06 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C30B15-30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C30B30-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C30B29-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B32B3-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C30B15-04 |
| filingDate |
2016-12-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2020-08-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_93d885639c9e3db027fbbaa646fb4496
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b80b1b0c46a99101cd4681e56cab9f3b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_088c246f5247983620c5d199e44f7fa9 |
| publicationDate |
2020-08-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-10731271-B2 |
| titleOfInvention |
Silicon wafer with homogeneous radial oxygen variation |
| abstract |
The invention relates to a silicon wafer having a radial variation of oxygen concentration of less than 7%, determined over the entire radius of the silicon wafer. The wafers are produced in the PV region with rotation of crystal and crucible in the same direction, and in the presence of a horizontal magnetic field of defined intensity. |
| priorityDate |
2015-12-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |