http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10679833-B2

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filingDate 2016-03-19-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2020-06-09-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d5561821945ba6b16f7e089f3654e02e
publicationDate 2020-06-09-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-10679833-B2
titleOfInvention Cylindrical sputtering target
abstract A cylindrical sputtering target includes a cylindrical substrate and a cylindrical sputtering target member joined together with a joining material. Where the joining material has a thickness of d (μm), the joining material has a coefficient of thermal expansion of α 1 (μm/μmK), and a melting point of the joining material and room temperature have a difference of ΔT (K), a surface of the cylindrical sputtering target member on the side of the joining material has a value of ten-point average roughness (Rz) fulfilling:n n d (μm)×α 1 (μm/μmK)×Δ T (K)≤ Rz (μm).
priorityDate 2015-03-23-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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Total number of triples: 38.