| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_36333273e27f0db23ddddbf80ba79ba7 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-218 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45591
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-4412 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-455
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-44
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-00 |
| filingDate |
2014-03-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2020-06-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_590a6a3b21f691516d42ceb3ccefa747
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4b88f540a3d20f5199be8b37dec9fb17
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_25888f3f2ea8902e2f4702a9703d2260
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8c965f2ceb4f080709b73a641031a9c2
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_92c08d79b9d983f2c6b066fa20251f31
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8338dfa17d28b95844d6d86c133d4760 |
| publicationDate |
2020-06-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-10669625-B2 |
| titleOfInvention |
Pumping liner for chemical vapor deposition |
| abstract |
One or more pumping liners are provided for use in chemical vapor deposition (CVD). A pumping liner encircles a deposition chamber within which a wafer is placed and into which a precursor is introduced to form a thin film on a surface of the wafer. The pumping liner regulates a rate and uniformity at which a gas is removed from the deposition chamber, which in turn affects a duration or degree to which different portions of the wafer are exposed to the precursor. Controlling exposure of the wafer to the precursor promotes uniformity of the film formed on the wafer as well an ability to regulate the thickness of the film formed on the wafer. In an embodiment, a pumping liner has at least one of relatively small liner apertures, an increased number of liner apertures or a non-uniform distribution of liner apertures within a body of the pumping liner. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-D922229-S
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2020267826-A1 |
| priorityDate |
2013-03-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |