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filingDate 2018-06-26-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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publicationDate 2020-05-12-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-10651058-B2
titleOfInvention Substrate processing method and substrate processing apparatus
abstract A substrate processing method includes a substrate holding step of horizontally holding a substrate having a first major surface and a second major surface at an opposite side of the first major surface, a coating film forming step of supplying a coating agent to the first major surface to form a sublimating coating film which covers the first major surface, and a coating film cleaning step of cleaning a front surface of the coating film.
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