| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_8a765d144ca2931bf86b802a8889d179 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-31
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02B2006-12188
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02B2006-12061
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-315 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03C3-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-28
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-48
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03C23-0055
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-221
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/A61B5-1455 |
| classificationIPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02B6-12 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C03C23-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-28
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-48
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-22
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C03C3-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/A61B5-1455 |
| filingDate |
2013-02-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2020-03-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c65bcd5316714f8abe02c998379d06a7
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e11dabbcfbcec0a5bbdfa16bf0d986b4
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_035f4896000438bc2d64bdeab772ddd6
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c98e80cb989a201815d6a02be580d572
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2dc7f8cf132647353a6c71ae00371792
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fd95dc737bb67044b2abf1d27f5d6492 |
| publicationDate |
2020-03-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-10604445-B2 |
| titleOfInvention |
Process for ion implantation |
| abstract |
The present invention relates to a substrate comprising an ion-implanted layer, for example a cation, wherein the ion implanted layer has a substantially uniform distribution of the implanted ions at a significantly greater depth than previously possible, to a well-defined and sharp boundary within the substrate. The invention further comprises said sub-strate wherein the substrate is a silicon based substrate, such as glass. The invention also comprises the use of said material as a waveguide and the use of said material in measurement devices. |
| priorityDate |
2012-02-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |