http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10563125-B2
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_baff81f7ecf4529d04b13d4ad3781ab1 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08K5-053 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C271-22 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08K5-0008 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G75-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F20-38 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K15-322 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K15-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K15-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08K5-49 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08J3-241 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C69-54 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K15-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K15-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K15-32 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G75-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C69-54 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C271-22 |
| filingDate | 2014-11-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2020-02-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7d46c6885015e70e3dda2adc55889fe3 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4dc1d015cae4731fbf3aab0200310335 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ec3b9d03e80f654d0775430076ce6cbd |
| publicationDate | 2020-02-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | US-10563125-B2 |
| titleOfInvention | Stabilizer for thiol-ene compositions |
| abstract | The present invention relates to stabilizers for thiol-ene compositions and to radiation curable thiol-ene compositions based thereon. Such radiation curable compositions can advantageously be used in inks, overprint varnishes, coatings, adhesives, for the making of 3D objects and for the making of solder resist and gel nails. Provided in particular is an inhibitor system (I) for thiol-ene compositions based on —at least one inhibitor compound (i) having a % DPPH radical scavenging activity of at least 90%, the inhibitor compound (i) being selected from substituted benzene compounds or substituted naphthalene compounds containing at least two substituents selected from the group consisting of hydroxyl groups and C1-C3 alkoxy groups bonded directly to the benzene or the naphthalene ring, —at least one acidic compound (ii) having a pKa between 1 and 3, and —at least one compound (iii) selected from the group consisting of phosphites and phosphonites, with the proviso that if the inhibitor compound (i) is a substituted benzene that it contains at least two hydroxyl groups bonded directly to the benzene ring. Also provided is an inhibitor system (II) for thiol-ene compositions based on that is based on —at least one inhibitor compound (i) having a % DPPH radical scavenging activity of at least 90%, the inhibitor compound (i) being selected from substituted benzene compounds or substituted naphthalene compounds containing at least two substituents selected from the group consisting of hydroxyl groups and C1-C3 alkoxy groups bonded directly to the benzene or the naphthalene ring, —at least one compound (iv) selected from the group consisting of spirophosphites, and —optionally, at least one acidic compound (ii) having a pKa between 1 and 3, and with the proviso that if the inhibitor compound (i) is a substituted benzene that it contains at least two hydroxyl groups bonded directly to the benzene ring. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10995270-B2 |
| priorityDate | 2013-12-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 248.