Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_c8fbf590463d3518a746d90a6a2c1c34 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_5e829b93e1bdf87272f2aaf3baaaa0f4 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-4966 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L27-0886 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-823431 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-823437 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-82385 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-66795 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-7851 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-28556 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-823821 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-401 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L27-0924 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-82345 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-823456 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L29-49 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-8238 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-285 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-8234 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-82 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L27-092 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L29-78 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L27-088 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L29-40 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L29-66 |
filingDate |
2017-03-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate |
2019-08-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bc50a444b65ffdcac8a6376c9a3fd8c5 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c83e9e49ce53bc9bec855f916def4d61 |
publicationDate |
2019-08-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
US-10388655-B2 |
titleOfInvention |
Increasing thickness of functional layer according to increasing recess area |
abstract |
A method of manufacturing a semiconductor device includes providing a substrate having first and second semiconductor fins, forming an insulating layer on the substrate having first and second recesses exposing a portion of the respective first and second semiconductor fins, forming a gate dielectric layer on the first and second recesses and the exposed portions of the first and second semiconductor fins, forming a first work function adjustment layer on the gate dielectric layer, forming a functional layer on the first function adjustment layer, and forming first and second gates on portions of the functional layer of the respective first and second semiconductor fins. The opening area of the first recess is larger than the opening area of the second recess. The thickness of the functional layer on the first semiconductor fin is greater than the thickness of the functional layer on the second semiconductor fin. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11145652-B2 |
priorityDate |
2016-08-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |