| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_00b6a7d89068f217d1f4efa9a94c5ded |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-1463
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B24B37-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B24B37-044
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09G1-02 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B37-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B37-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09G1-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K3-14 |
| filingDate |
2017-02-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2019-08-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_86bf8a02f53702a04e2249e5cef9249a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0d42b6feb1bccccdeeff0caee8737a61 |
| publicationDate |
2019-08-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-10377014-B2 |
| titleOfInvention |
Increased wetting of colloidal silica as a polishing slurry |
| abstract |
A method, kit, and composition for polishing a sapphire surface are described here. The invention involves a sapphire surface polishing composition comprising colloidal silica particles and an extended or gemini surfactant that can reduce the contact angles of the polishing composition on both polishing pads and sapphire surfaces. |
| priorityDate |
2017-02-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |