| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_6409e25ad5decbd043ed7439fbf842ed |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N2291-0255
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N2291-0256
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N2291-0423
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N2291-0426
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N2291-0422
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H03H9-175
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N2291-015
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N2291-014 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N29-032
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N29-222
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H03H9-1007
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N29-022
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H03H9-02007
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N29-036 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N29-22
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N29-036
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H03H9-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N29-032
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N29-02 |
| filingDate |
2016-12-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2019-06-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_65c0ff6160d5db36e8d48aaaab7969b6
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9a7dee4d2159b6c5acf3689e13d125fb |
| publicationDate |
2019-06-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-10330642-B2 |
| titleOfInvention |
BAW sensor device with peel-resistant wall structure |
| abstract |
Lateral boundaries of a fluidic passage of a fluidic device incorporating at least one BAW resonator structure are fabricated with photosensitive materials (e.g., photo definable epoxy, solder mask resist, or other photoresist), allowing for high aspect ratio, precisely dimensioned walls. Resistance to delamination and peeling between a wall structure and a base structure is enhanced by providing a wall structure that includes a thin footer portion having a width that exceeds a width of an upper wall portion extending upward from the footer portion, and/or by providing a wall structure arranged over at least one anchoring region of a base structure. Anchoring features may include recesses and/or protrusions. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2019265197-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11353428-B2 |
| priorityDate |
2015-12-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |