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filingDate 2015-08-28-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2019-06-11-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9a9f4dd58c7b92ade3c183de10cfeacc
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publicationDate 2019-06-11-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-10315166-B2
titleOfInvention Etching mask, manufacturing method therefor, porous membrane manufacturing method using etching mask, porous membrane, fine dust-blocking mask including porous membrane, and manufacturing method for surface enhanced Raman scattering active substrate
abstract The present disclosure provides an etching mask, a method for manufacturing the same, a method for manufacturing a porous membrane using the same, a porous membrane, a fine dust blocking mask including the same, and a method for manufacturing a surface enhanced Raman scattering active substrate. In this connection, the etching mask includes an organic film; and a pattern layer disposed on the organic film, wherein the pattern layer has openings defined therein having a uniform size, wherein each of the openings includes a micro-scale or nano-scale hole.
priorityDate 2014-08-29-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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