Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_f21919d8c67a1dd15ec05f467253b86e http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_65f44626f7511a3c23df94408082d4db |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y02P20-582 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D2323-34 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D71-024 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D67-0079 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D71-022 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D67-0034 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01D71-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01D67-00 |
filingDate |
2015-08-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate |
2019-06-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9a9f4dd58c7b92ade3c183de10cfeacc http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c70b21e6e829238e53eaba4959f7cfab http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_85725a0f72d2eb32ebc459722fcd184f |
publicationDate |
2019-06-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
US-10315166-B2 |
titleOfInvention |
Etching mask, manufacturing method therefor, porous membrane manufacturing method using etching mask, porous membrane, fine dust-blocking mask including porous membrane, and manufacturing method for surface enhanced Raman scattering active substrate |
abstract |
The present disclosure provides an etching mask, a method for manufacturing the same, a method for manufacturing a porous membrane using the same, a porous membrane, a fine dust blocking mask including the same, and a method for manufacturing a surface enhanced Raman scattering active substrate. In this connection, the etching mask includes an organic film; and a pattern layer disposed on the organic film, wherein the pattern layer has openings defined therein having a uniform size, wherein each of the openings includes a micro-scale or nano-scale hole. |
priorityDate |
2014-08-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |