http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10260164-B2

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filingDate 2017-05-15-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2019-04-16-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_08cc70664950b9323ac87a7c17336a8b
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publicationDate 2019-04-16-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-10260164-B2
titleOfInvention Methods and apparatus for deposition processes
abstract Methods and apparatus for deposition processes are provided herein. In some embodiments, an apparatus may include a substrate support comprising a susceptor plate having a pocket disposed in an upper surface of the susceptor plate and having a lip formed in the upper surface and circumscribing the pocket, the lip configured to support a substrate on the lip; and a plurality of vents extending from the pocket to the upper surface of the susceptor plate to exhaust gases trapped between the backside of the substrate and the pocket when a substrate is disposed on the lip. Methods of utilizing the inventive apparatus for depositing a layer on a substrate are also disclosed.
priorityDate 2010-02-26-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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