| abstract |
A semiconductor device of an embodiment includes a first nitride semiconductor layer, a second nitride semiconductor layer located on the first nitride semiconductor layer and having a larger bandgap than the first nitride semiconductor layer, a first electrode on the second nitride semiconductor layer, a second electrode on the second nitride semiconductor layer, a gate electrode located between the first electrode and the second electrode, and a first insulating layer located at least between the gate electrode and the second electrode on the second nitride semiconductor layer, the first insulating layer being an oxide of at least one first element selected from the group consisting of Hf, Zr, and Ti, and containing 5×10 19 cm −3 or more of at least one second element selected from the group consisting of F, H, D, V, Nb, and Ta, and 5×10 19 cm −3 or more of at least one third element selected from the group consisting of N, P, As, Sb, Bi, Be, Mg, Ca, Sr, Ba, Sc, Y, and lanthanoids. |