| abstract |
A field-effect transistor and a manufacturing method thereof are provided. The method includes depositing a first insulating layer on a substrate; forming a source electrode and a drain electrode on the first insulating layer; forming a carbon quantum dots active layer covering the source electrode and the drain electrode; and forming a second insulating layer and a gate electrode on the carbon quantum dots active layer sequentially. According to the above method, the present disclosure making the field-effect transistor active layer with carbon quantum dots as materials, which enriches the material of the field-effect transistor, reduces the environmental pollution in current technology by using metal dots film, and reduces the dependence on metal elements. |