Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_33c922e05f6133b7d72dbb849d77487d |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D2325-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D71-28 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D2325-28 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D69-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D67-0093 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D69-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D69-10 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D71-56 |
classificationIPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01D71-28 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01D69-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01D69-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01D67-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01D71-56 |
filingDate |
2014-08-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate |
2018-10-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ce7694bfa6ff17560eaf9817ea503dd7 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3e75e7a8c2f83d69a0560de1a9367274 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2af4e447a270afc48283f0f767d6a2ca http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6db266a745e2aa4db4137c82ea5e4257 |
publicationDate |
2018-10-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
US-10112154-B2 |
titleOfInvention |
Polyamide-based water-treatment separation membrane having excellent durability, and manufacturing method therefor |
abstract |
The present invention relates to a water treatment separation membrane having improved durability and including a porous support; a polyamide active layer formed on the porous support; and a protective layer formed on the polyamide active layer and including polyvinyl pyrrolidone, wherein a thickness of the protective layer is 0.5 nm to 1000 nm, and a method for manufacturing the same. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11577971-B2 |
priorityDate |
2013-08-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |