| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_02cfb0f1aa2718c61bdf184d53adfe79 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03C2203-44
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03C2201-42
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03B2215-44
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03B2207-80
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03B2207-70
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03B2201-42 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-60
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03B23-0493
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03B11-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03B19-1469
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03C3-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03B19-1415
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03B32-005 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C03B32-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C03C3-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C03B23-049
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C03B19-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C03B11-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-60 |
| filingDate |
2015-03-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2018-10-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_be910ddfb616870fe701e1fde3623bd9 |
| publicationDate |
2018-10-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-10093572-B2 |
| titleOfInvention |
Manufacturing method for SiO2-TiO2 based glass and manufacturing method for photomask substrate made of SiO2-TiO2 based glass |
| abstract |
A method for manufacturing an SiO 2 —TiO 2 based glass upon a target by a direct method, includes: an ingot growing step of growing an SiO 2 —TiO 2 based glass ingot having a predetermined length on the target by flame hydrolysis by feeding a silicon compound and a titanium compound into an oxyhydrogen flame, wherein the ingot growing step includes: a first step of increasing a ratio of a feed rate of the titanium compound to a feed rate of the silicon compound as the SiO 2 —TiO 2 based glass ingot grows until the ratio reaches a predetermined value; and a second step of gradually growing the SiO 2 —TiO 2 based glass ingot after the ratio has reached the predetermined value in the first stage with keeping the ratio within a predetermined range. |
| priorityDate |
2012-09-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |