http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10090300-B2

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filingDate 2015-10-16-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2018-10-02-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e268270523f3e56d53b3cbeaff77eaa6
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publicationDate 2018-10-02-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-10090300-B2
titleOfInvention Fin-like field effect transistor (FinFET) device and method of manufacturing same
abstract A FinFET device and method for fabricating a FinFET device is disclosed. An exemplary method includes providing a semiconductor substrate; forming a first fin structure and a second fin structure over the semiconductor substrate; forming a gate structure over a portion of the first and second fin structures, such that the gate structure traverses the first and second fin structures; epitaxially growing a first semiconductor material on exposed portions of the first and second fin structures, such that the exposed portions of the first and second fin structures are merged together; and epitaxially growing a second semiconductor material over the first semiconductor material.
priorityDate 2010-11-02-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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