| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_664f5b543543aac4cf0153a4ef4e0f85 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y02E60-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-3365
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-31701
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y02E60-324
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-0473
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-006
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-0815
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-08 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J27-22
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32458
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3171
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C01B3-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32807 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C01B3-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J27-22
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-31
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-317 |
| filingDate |
2016-10-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2018-10-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4de4267d3da1ea453774f139f4022baf
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7a6a7fd1dba15b5fbef8e0147f49ffca
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_df5cb96e164fcd8813cfcbebf8d34a08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_354e3b1f687cf2af1643dd58f19f2c24 |
| publicationDate |
2018-10-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-10090133-B2 |
| titleOfInvention |
Boron-containing dopant compositions, systems and methods of use thereof for improving ion beam current and performance during boron ion implantation |
| abstract |
A novel composition, system and method for improving beam current during boron ion implantation are provided. In a preferred aspect, the boron ion implant process involves utilizing B2H6, 11BF3 and H2 at specific ranges of concentrations. The B2H6 is selected to have an ionization cross-section higher than that of the BF3 at an operating arc voltage of an ion source utilized during generation and implantation of active hydrogen ions species. The hydrogen allows higher levels of B2H6 to be introduced into the BF3 without reduction in F ion scavenging. The active boron ions produce an improved beam current characterized by maintaining or increasing the beam current level without incurring degradation of the ion source when compared to a beam current generated from conventional boron precursor materials. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10920087-B2 |
| priorityDate |
2014-03-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |