Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_424db9d56b06a23aed410fcf5df652f3 |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B32B2255-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B32B2307-206 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B32B2457-14 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D183-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G77-52 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G77-48 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G77-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0757 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0382 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0274 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0277 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L83-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B32B3-30 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B32B3-266 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B32B3-30 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B32B3-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D183-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L83-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-075 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G77-52 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G77-48 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G77-14 |
filingDate |
2015-12-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate |
2018-10-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_05f24d2638752f91da99fd428166da82 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_36a022477ff7eb5d7149203b2aec646b http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0a6c7650c719ac8d174c25eca4982f8d http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_dfd817b3b4b7b6b42ab0ea6796adcec2 |
publicationDate |
2018-10-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
US-10087288-B2 |
titleOfInvention |
Silicone skeleton-containing polymer compound, chemically amplified negative resist composition, photo-curable dry film and method for producing same, patterning process, layered product, substrate, and semiconductor apparatus |
abstract |
The present invention provides a silicone skeleton-containing polymer compound containing a repeating unit shown by the general formula (1). There can be provided a silicone skeleton-containing polymer compound suitable used as a base resin of a chemically amplified negative resist composition that can remedy the problem of delamination generated on a metal wiring such as Cu and Al, an electrode, and a substrate, especially on a substrate such as SiN, and can form a fine pattern without generating a scum and a footing profile in the pattern bottom and on the substrate. |
priorityDate |
2015-01-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |