Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_36333273e27f0db23ddddbf80ba79ba7 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L23-481 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76885 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76898 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76877 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-4821 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76892 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L23-53276 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L23-5283 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L23-528 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L23-532 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-768 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L23-48 |
filingDate |
2016-02-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate |
2018-09-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_17e86689398e1183859b4304205fcefe http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_22749af96ebc50a82eb4bc0112ff3754 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c0a22cc83309c84b0f1780fdd7bdf2ce http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_dc8144bf0718a94598514be5068143f3 |
publicationDate |
2018-09-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
US-10074607-B2 |
titleOfInvention |
Semiconductor device structure with graphene layer |
abstract |
A semiconductor device structure and method for forming the same are provided. The semiconductor device structure includes a substrate and an interconnect structure formed over the substrate. The interconnect structure includes a first dielectric layer formed over the substrate, and a first graphene layer formed in and on the first dielectric layer. The first graphene layer includes a first portion in the first dielectric layer and a second portion on the first dielectric layer and a first insulating layer formed over the first portion of the first graphene layer. |
priorityDate |
2016-02-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |