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filingDate 2016-02-05-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2018-09-11-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_17e86689398e1183859b4304205fcefe
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publicationDate 2018-09-11-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-10074607-B2
titleOfInvention Semiconductor device structure with graphene layer
abstract A semiconductor device structure and method for forming the same are provided. The semiconductor device structure includes a substrate and an interconnect structure formed over the substrate. The interconnect structure includes a first dielectric layer formed over the substrate, and a first graphene layer formed in and on the first dielectric layer. The first graphene layer includes a first portion in the first dielectric layer and a second portion on the first dielectric layer and a first insulating layer formed over the first portion of the first graphene layer.
priorityDate 2016-02-05-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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Total number of triples: 42.