Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fd446fb0d73aa96d044fea2eaa3c8ebc |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-455 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-50 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-334 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B81C1-00531 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3244 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32449 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32798 |
classificationIPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-455 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-50 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-32 |
filingDate |
2017-01-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate |
2018-07-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ebd9aa98f13c0ed35bb693d352c7ed93 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_54b98a2c635d9bcfc9eebebcd3ec8e7d http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_eccf3f028bc78e30517601ef55bb0520 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b0464544bdd9a4b34395fb0f76863a2c http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_75d9b0e58ce5a4426ca989e1fa04c3e4 |
publicationDate |
2018-07-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
US-10020169-B2 |
titleOfInvention |
Etching device and etching method |
abstract |
An etching device and an etching method. The etching device includes an etching chamber and a chuck located therein for clamping a substrate to be etched, a plasma generating device surrounding the etching chamber in an area and a gas nozzle distribution device for introducing etching gas, which is situated above the chuck in such a way that an etching gas stream is directed essentially perpendicular to a surface of the substrate to be etched. A moving mechanism may be used to change the distance between the gas nozzle distribution device and the chuck as a function of the etching mode. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I747323-B |
priorityDate |
2016-01-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |