| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_66f89df3a6fc6243dbb41367435b8262
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_0ddb9f3656270bc5410be3679322fead |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08J2379-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B32B2307-51
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B32B2307-54
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B32B2307-306
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B32B2037-1223
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B29L2007-008
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B32B2262-105
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L2205-025
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B32B2260-046
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B32B2260-023
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B32B2605-18
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B32B2037-1238
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B29K2079-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B32B2313-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B32B2379-08 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D179-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G73-1053
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B32B5-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B29C39-38
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B32B38-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B32B37-1207
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08J5-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08J5-18
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G73-1071
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G73-1046
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G73-1042
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L79-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B29C39-02 |
| classificationIPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B29L7-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B29K79-00 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B32B5-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B32B38-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G73-10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B32B37-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B29C39-38
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B29C39-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D179-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08J5-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08J5-18
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L79-08 |
| filingDate |
2014-04-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2018-07-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_40d4e3e2609fe51413381e103d0cfa30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_38e9dee2b0541be6c42842833f09aaaa
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0affbe607cc921bf66e84e7ec0c5fe45
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fb6f8cfaaa885a52df00a1047323036e |
| publicationDate |
2018-07-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-10017666-B2 |
| titleOfInvention |
Polyimide resin composition and varnish produced from terminal-modified imide oligomer prepared using 2-phenyl-4,4′-diaminodiphenyl ether and thermoplastic aromatic polyimide prepared using oxydiphthalic acid, polyimide resin composition molded article and prepreg having excellent heat resistance and mechanical characteristic, and fiber-reinforced composite material thereof |
| abstract |
An imide resin composition including a terminal-modified imide oligomer of General Formula (1) and a thermoplastic aromatic polyimide of General Formula (2). (In Formula (1), either R 1 or R 2 shows a phenyl group and the other shows a hydrogen atom; R 3 and R 4 show a divalent residue of aromatic diamine; R 5 and R 6 show a tetravalent residue of aromatic tetracarboxylic acid; m and n satisfy relationships of m≥1, n≥0, 1≤m+n≤20, and 0.05≤m/(m+n)≤1; and an arrangement of repeating units may be either a block or random.) (In Formula (2), R 1 and R 2 show a divalent residue of aromatic diamine; R 3 shows a tetravalent residue of aromatic tetracarboxylic acid; m and n satisfy relationships of m≥1 and n≥0, and an arrangement of repeating units may be either a block or random). |
| priorityDate |
2013-05-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |