http://rdf.ncbi.nlm.nih.gov/pubchem/patent/UA-137104-U
Outgoing Links
| Predicate | Object |
|---|---|
| filingDate | 2019-01-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2019-10-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | UA-137104-U |
| titleOfInvention | INSTALLATION OF BLACK SILICON IN PLASMA FLOWS OF HELICON DISCHARGE |
| abstract | The black silicon production unit comprises several series-connected RF plasma processing chambers, inlet and outlet chambers, intermediate vacuum elements that ensure the movement and positioning of the silicon substrate from one chamber to another, pumping means, gas system and power supplies. The chambers of the RF plasma treatment unit are equipped with helicon discharge excitation systems. The holder of the silicon substrate is placed on the axis of symmetry coaxial with respect to the helical antenna of the excitation of the helicon discharge. |
| priorityDate | 2019-01-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 11.