http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-M621547-U
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_3b4f2de982551e2e6b85c035dc08bb58 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_6f0f62576376d0c659aca85c66f9755c |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/F23J15-00 |
| filingDate | 2021-09-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bfd7bb5e88b3a083abf5c43631c28fde |
| publicationDate | 2021-12-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | TW-M621547-U |
| titleOfInvention | A semiconductor waste gas treatment system |
| abstract | A semiconductor waste gas treatment system is composed of a vacuum pumping device, a plasma processing device and a wet scrubbing device. A two stages vacuum pumping is employed, such as a booster pump along with a dry pump. A low pressure plasma process is adopted and installed between the two pumps, leading to efficient gas reactions with a low energy consumption. Meanwhile, the back stream issues possibly caused by the plasma process is eliminated in this invention. Above all, a large flow of purge gas such as nitrogen usually used in a dry pump is not necessary, resulting in the reduction of the cost of pumping system and the amount of emission of NOn x that is harmful to environment. In the last stage, a jet flow micro-bubble wet scrubber is used for the efficient absorption of gases and particles absorption; Moreover, it can generate a rough vacuum at the output port of the pump, which significantly increases the pumping efficiency and eliminates the particle blockage inside the pump. |
| priorityDate | 2021-09-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 42.