| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fcc0b66123940d1b32783569ebfa2d45 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-162 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0757
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F212-22
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F12-22
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D125-18
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F12-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2012
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F12-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-38
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F12-22
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F20-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F20-18
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 |
| filingDate |
2018-06-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2022-02-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6e13ce517ec4c39dff4f7cf07d949690 |
| publicationDate |
2022-02-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-I754756-B |
| titleOfInvention |
Radiation sensitive resin composition and resist pattern forming method |
| abstract |
A radiation-sensitive resin composition comprising: a first polymer having a first structural unit containing a phenolic hydroxyl group and a second structural unit containing an acid dissociable group; and a second polymer having a fluorine atom and a silicon atom at least one, and has a third structural unit containing an alkali dissociable group; a first compound, which is generated by irradiation with radiation and causes the acid dissociation based on a temperature of 80°C or higher and 130°C or lower, T X °C and 1 minute An acid that dissociates under the conditions of the above-mentioned conditions; and a second compound that generates a carboxylic acid whose dissociation property of the acid does not substantially dissociate under the conditions of the temperature T x °C and 1 minute by irradiation with radiation, and causes the acid to dissociate. The acid dissociation property is based on a sulfonic acid that does not substantially dissociate under the conditions of the temperature T X °C and 1 minute, or a combination thereof. |
| priorityDate |
2017-06-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |