| abstract |
Provided is a resist composition which generates an acid upon exposure and changes a solubility in a developing solution under an action of the acid, the resist composition containing a base material component whose solubility in the developing solution changes under the action of an acid and an acid generator represented by general formula (b1). In general formula (b-1), R b1 represents an aromatic hydrocarbon group having at least one alkyl group having 3 or more carbon atoms as a substituent, Y b1 represents a divalent linking group containing an ester bond (-C(=O)-O- or -O-C(=O)-), V b1 represents an alkylene group, a fluorinated alkylene group, or a single bond, m is an integer of 1 or more, and M m+ represents an m-valent organic cation. n R b1 -Y b1 -V b1 -CF 2 -SO 3 - (M m+ ) 1/m ...(b1) |