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filingDate 2019-04-16-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2021-12-21-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_66e423f09121661446b779c1393068a9
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publicationDate 2021-12-21-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber TW-I750469-B
titleOfInvention Target and process for producing a target
abstract Target for physical vapour phase deposition having the following chemical composition:n- 95 mol% to 100 mol% of a mixture of at least two of the following compounds: titanium diboride (TiB 2 n) and/or vanadium diboride (VB 2 n) and/or mixed phases ((Ti,V)B 2 n) of titanium diboride (TiB 2 n) and vanadium diboride (VB 2 n)n- 0.01 mol% to 5 mol% of carbon (C)n- less than 0.01 mol% of borides other than titanium diboride (TiB 2 n) and/or vanadium diboride (VB 2 n) and/or mixed phases ((Ti,V)B 2 n) of titanium diboride (TiB 2 n) and vanadium diboride (VB 2 n),nwherein in respect of the metallic purity the sum of the mixture of titanium diboride (TiB 2 n) and/or vanadium diboride (VB 2 n) and/or mixed phases ((Ti,V)B 2 n) of titanium diboride (TiB 2 n) and vanadium diboride (VB 2 n) and the carbon (C) amounts to at least 99.8 mol%,nand having the following physical properties:n- a density greater than 90%, preferably greater than 95%, of the theoretical density of the chemical composition defined aboven- an average grain size of grains of the mixture of titanium diboride (TiB 2 n) and/or vanadium diboride (VB 2 n) and/or mixed phases ((Ti,V)B 2 n) of titanium diboride (TiB 2 n) and vanadium diboride (VB 2 n) of less than 10 micrometers, preferably less than 3 micrometers.
priorityDate 2018-04-20-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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