http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I750241-B
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_89afae566b725ae78e20cf972d9bcdc7 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-031 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0007 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-16 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| filingDate | 2017-10-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2021-12-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_182ce94e592a918ab24d83a9fdad8e5f http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bbed6672aa3c6cb21a84294f4bb0fa9e http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4b4472677e6ab5751507a2b14c819460 |
| publicationDate | 2021-12-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | TW-I750241-B |
| titleOfInvention | Photosensitive composition and method for forming hardened film |
| abstract | The present invention provides a photosensitive composition capable of suppressing the generation of foreign matter in the photosensitive composition and capable of satisfactorily analyzing a fine pattern, and a method for forming a cured film using the photosensitive composition. In the present invention, an amine (E) is prepared in a photosensitive composition containing an alkali-soluble resin (A), a photopolymerizable compound (B), a photopolymerization initiator (C), and a solvent (S), and an oxime is used in combination The ester compound (C1) and the compound (C2) other than the oxime ester compound are used as the photopolymerization initiator (C), and the amount of chloride ions in the photosensitive composition shall be 1000 mass ppm or less. |
| priorityDate | 2016-10-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 553.