| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_a665d61597c2731ab4130971ee397dc9 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02074
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D7-5009
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02065
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D11-0047
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D7-34
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-304
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D1-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D1-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02052 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09G1-02 |
| filingDate |
2017-03-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2021-12-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c3672b16be9e01dfcbc6e20dbb5a76f5 |
| publicationDate |
2021-12-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-I747891-B |
| titleOfInvention |
Surface treatment composition, surface treatment composition manufacturing method, surface treatment method, and semiconductor substrate manufacturing method |
| abstract |
The present invention provides a means for sufficiently removing organic residues remaining on the surface of a polished object including silicon nitride, silicon oxide, or polysilicon. The present invention relates to a surface treatment composition, which contains a polymer compound having a sulfonic acid (salt) group and water, and has a pH value of less than 7, and is used to reduce the level of a polished object including silicon nitride, silicon oxide or polysilicon Organic residues on the surface. |
| priorityDate |
2016-03-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |