| abstract |
The present invention provides a photosensitive ray-sensitive or radiation-sensitive resin composition, and a photosensitive ray-sensitive or radiation-sensitive resin composition using the photosensitive ray-sensitive or radiation-sensitive resin composition, a pattern forming method, and a manufacturing method of an electronic device, In the sensitizing radiation-sensitive or radiation-sensitive resin composition of the present invention, when the exposure latitude is set to EL and the aerial image intensity logarithmic slope is set to NILS, the relationship expressed by the specific formula is satisfied, especially in the formation of ultrafine For example, contact hole patterns with apertures of 45 nm or less or line and space patterns with line widths of 45 nm or less can be formed with excellent roughness performance, exposure latitude, and focus margin. |