abstract |
A photosensitive resin composition for forming interlayer insulating film, including an alkali-soluble resin (A), a photosensitizer (B), a thermal acid generator (T) which generates acid upon heating, and a silane coupling agent (C), the alkali-soluble resin (A) having a structural unit (A1) represented by general formula (a-1) shown below or an alicyclic epoxy group-containing unit (A3) (in the formula, R represents a hydrogen atom or a methyl group, and Ra 01 represents a hydrogen atom or an organic group having a hydroxy group). |