http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I741014-B
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_89afae566b725ae78e20cf972d9bcdc7 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-031 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02B1-10 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02B1-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F2-40 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-031 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-027 |
| filingDate | 2017-08-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2021-10-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a94ad2454631c4e26d3471c10e56b9e3 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3d3736abfdbff358789ddcf9633764d9 |
| publicationDate | 2021-10-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | TW-I741014-B |
| titleOfInvention | Pattern forming photosensitive resin composition, cured film, low-refractive index film, optical device, and forming method of patterned cured film or low-refractive index film |
| abstract | [Problem] Provide a photosensitive resin composition for pattern formation that is easy to form a pattern with a desired size and a good shape and no residue is generated under a wide range of exposure doses, and harden the photosensitive resin composition for pattern formation The cured film and the low refractive index film formed, the optical device provided with the cured film or the low refractive index, and the cured film or low refractive index film using the photosensitive resin composition for pattern formation described above. [Solution] The photosensitive resin composition for pattern formation containing the resin (A), the photopolymerizable compound (B), and the polymerization initiator (C) is blended with a hindered phenol compound with a molecular weight of 230 to 1500 as Polymerization inhibitor (D). |
| priorityDate | 2016-10-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 747.