http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I738053-B
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_2fb272959740a2231f287ac6bf4d190a |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02046 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02337 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-4409 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-4405 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-4412 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67253 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-52 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67248 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-4584 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67098 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67028 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67017 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-67 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B08B11-00 |
| filingDate | 2019-09-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2021-09-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f6174edd6bd3d9573eef76d1991cba45 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2982129ce5a3ba94cc62f226a08d378a http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_53eda6d3da78c38aa541fcf984877edd http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1dda8e672f6baa1a9e643f7ad12a1408 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_27dedd4ed60052ef639f31434b10c2e1 |
| publicationDate | 2021-09-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | TW-I738053-B |
| titleOfInvention | Cleaning method, manufacturing method of semiconductor device, substrate processing device and recording medium |
| abstract | After cleaning the processing container in the present invention, subsequent substrate processing can be performed without reducing productivity.nClean the inside of the processing container by performing the following steps: (a) Supply and exhaust the first gas containing fluorine-based gas at the first flow rate into the processing container set to the first temperature after the substrate has been processed Gas, the step of removing substances adhering to the processing container; (b) Set the second temperature higher than the first temperature after (a) to the processing container at a higher flow rate than the first flow rate and the third flow rate Each of them is a step of supplying a second gas that does not chemically react with fluorine at the second temperature and exhausting the second gas at a high second flow rate to physically detach and remove the residual fluorine in the processing container; and (c) A third gas that chemically reacts with fluorine at the third temperature is supplied at a third flow rate into a processing container set to a third temperature higher than the first temperature after (a), and the processing is performed The step of chemically detaching and removing the residual fluorine in the container. |
| priorityDate | 2018-09-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 58.