| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_823a7219dc55a9660dc77a337aec8c1d |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31053 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09G1-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B24B57-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B24B37-0056
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B24B37-044
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-1463
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3212 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K3-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B37-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09G1-02 |
| filingDate |
2019-11-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2021-07-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_79646b17f1987010b753cdcc96780c7c
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a95d19a14d8d4555eb3798f98cc8deef
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_359d0402d5d326ab516f248ad7b5f81f
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8e4956901c57e3b3eca47219e57de036
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_330eb93e5b5b34377b58642304d17f7d |
| publicationDate |
2021-07-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-I734255-B |
| titleOfInvention |
Composition and method for cobalt cmp |
| abstract |
A chemical mechanical polishing composition for polishing a substrate having a cobalt layer includes a water based liquid carrier, cationic silica abrasive particles dispersed in the liquid carrier, and a triazole compound, wherein the polishing composition has a pH of greater than about 6 and the cationic silica abrasive particles have a zeta potential of at least 10 mV. The triazole compound is not benzotriazole or a benzotriazole compound. A method for chemical mechanical polishing a substrate including a cobalt layer includes contacting the substrate with the above described polishing composition, moving the polishing composition relative to the substrate, and abrading the substrate to remove a portion of the cobalt layer from the substrate and thereby polish the substrate. |
| priorityDate |
2018-12-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |