abstract |
A novel onium salt having formula (1) and a resist composition comprising the same as a quencher are provided. When the resist composition is processed by photolithography using high-energy radiation, there is formed a resist pattern which is improved in LWR and CDU. In formula (1), R 1 n, R 2 nand R 3 neach are a C 1 n-C 20 nmonovalent hydrocarbon group which may contain a heteroatom exclusive of fluorine, and Z + nis a sulfonium, iodonium or ammonium cation. |