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filingDate 2019-09-25-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2021-07-11-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_926b08cd2f1681877250ba029f56b2fb
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publicationDate 2021-07-11-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber TW-I733197-B
titleOfInvention Onium salt, resist composition, and pattern forming process
abstract A novel onium salt having formula (1) and a resist composition comprising the same as a quencher are provided. When the resist composition is processed by photolithography using high-energy radiation, there is formed a resist pattern which is improved in LWR and CDU. In formula (1), R 1 n, R 2 nand R 3 neach are a C 1 n-C 20 nmonovalent hydrocarbon group which may contain a heteroatom exclusive of fluorine, and Z + nis a sulfonium, iodonium or ammonium cation.
priorityDate 2018-09-28-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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