| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_2a3bb4ae410da4be8184239adc5ab1c0 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45525
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-405
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0228
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-40
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02181
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45553
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02189 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-40
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-02 |
| filingDate |
2017-05-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2021-06-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ee6946f45c5f540bb7b4285e8084b023
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3420599cfe09e1ab7f8e11c85b7ab46c
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_630adcb05762143d7482263f6063884a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c8260c8d84661af3d7586925f4b2b540
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3ea27f41a2081ae63f73cbbac4d7c030 |
| publicationDate |
2021-06-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-I731074-B |
| titleOfInvention |
Processes and methods for selective deposition on first surface of substrate relative to second surface of substrate |
| abstract |
Vapor deposition processes are provided in which a material nis selectively deposited on a first surface of a substrate relative to a second organic surface of the substrate. A substrate comprising a first surface is contacted with a first vapor phase hydrophobic reactant and a second vapor phase reactant such that the material is deposited selectively on the first surface relative to the second norganic surface. The second organic surface may comprise, for example, a self-assembled monolayer, a directed self-assembled layer, or a polymer. The material that is deposited may be, for example, a metal or metallic material. The material is a metal oxide, such as ZrO 2 or HfO 2 . The vapor deposition process is a cyclic chemical vapor deposition process or an atomic layer deposition process. The material is deposited on the first surface relative to the second surface with a selectivity of greater than about 50%. |
| priorityDate |
2016-05-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |