http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I728346-B

Outgoing Links

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filingDate 2017-08-23-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2021-05-21-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_76fc9720b583540bde658b9183fb2959
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publicationDate 2021-05-21-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber TW-I728346-B
titleOfInvention Substrate processing device and substrate processing method
abstract The substrate processing apparatus includes: a rotating unit that rotates the substrate held by the substrate holding unit contained in the chamber around a vertical axis of rotation; and the nozzle has an ejection port for moving from the ejection port toward the rotating unit The main surface of the held substrate sprays liquid; the first chemical liquid supply unit is used to supply the first chemical liquid to the aforementioned nozzle; the processing cover is used to house the aforementioned substrate holding unit and has a plurality of cylindrical protective covers, The plurality of cylindrical protective covers includes a cylindrical first protective cover surrounding the periphery of the substrate holding unit and a cylindrical second protective cover surrounding the periphery of the first protective cover; the lifting unit is used for Raising and lowering at least one of the plurality of protective covers; and a control device that controls the rotation unit, the first liquid medicine supply unit, and the lifting unit; the control device executes: the upper position arrangement step, which is to move the aforementioned rotating unit, the first chemical liquid supply unit, and the aforementioned lifting unit; At least one of the plurality of protective covers is arranged at an upper position, and the upper position is set to a predetermined upper position that is higher than a predetermined liquid contact position and can catch the liquid scattered from the substrate by the protective cover, The predetermined liquid contact position is capable of receiving the first chemical solution scattered from the substrate rotated by the rotating unit by the protective cover; and the first chemical liquid supply step is in a state where the protective cover is arranged at the upper position Next, the first chemical solution is supplied to the main surface of the substrate while the substrate is rotated by the rotation unit.
priorityDate 2016-08-24-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

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Total number of triples: 31.