http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I728067-B
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fcc0b66123940d1b32783569ebfa2d45 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0274 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-42 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0002 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-30 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K3-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K3-46 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-40 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-032 |
| filingDate | 2017-03-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2021-05-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9192c399533d31f9ea695746491a06bb http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f77eba0c5db6899eaaf8c2c569ca8e6f http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2813f5d89b84f6e61fe0b9d32971f945 |
| publicationDate | 2021-05-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | TW-I728067-B |
| titleOfInvention | Pattern forming method and radiation-sensitive resin composition |
| abstract | The present invention provides a pattern forming method that reduces the number of lithography steps and can form fine patterns. The pattern forming method of the present invention includes a step of forming a first coating film that has liquid repellency and is lyophilized by irradiation energy on a substrate; a step of removing the insulating layer in the first region on the substrate; and The step of forming a concave pattern in the second area in at least a part of the area other than the first area on the substrate; and the step of removing the insulating layer in the first area includes irradiating energy of a specific wavelength and making the first area of the first area 1 The step of removing the first coating film in the first region by contacting the coating film with a specific chemical solution, and forming a concave pattern in the second region includes irradiating energy of a specific wavelength to make the surface of the insulating layer in the second region prone Liquefaction step. |
| priorityDate | 2016-03-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 216.