http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I713440-B
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_44ff3005508304394801e265e503b811 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0382 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-80 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-32 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-32 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate | 2014-11-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2020-12-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_72d1c5476fc89f1b46bf94a8d96797b6 |
| publicationDate | 2020-12-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | TW-I713440-B |
| titleOfInvention | Method of manufacturing transfer mask and develoer |
| abstract | The present invention provides a technology for reducing the swelling, pattern collapse, and deformation of the resist pattern to form a resist pattern with linear pattern edges.nn n n The present invention relates to a manufacturing method of a transfer mask, which includes the steps of preparing a substrate with a thin film; forming a resist film on the surface of the thin film; exposing the resist film; The step of developing the resist film after exposure to form a resist pattern; the step of etching the film using the resist pattern as a mask; and in the step of forming the resist pattern, the resist The film is a resist film formed by a chemically amplified and negative resist solution. The developer used in the above-mentioned development step includes: solvent A and solvent B as organic solvents, and organic solvents and The solvent A and the solvent B are more difficult to dissolve the resist film than the solvent C. The solvent A has a higher boiling point than the solvent C, and the solvent C has a higher boiling point than the solvent B. |
| priorityDate | 2013-12-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 201.