| abstract |
While suppressing the damage of the film that does not form a thin film, a thin film is selectively formed on the substrate.nSequentially:nFor the substrate where at least the first film and the second film different from the first film are exposed on the surface, the process of supplying the first inorganic material to remove the natural oxide film from the surface of the substrate;nFor the aforementioned substrate, the process of supplying an oxidant to oxidize the aforementioned first film to form an oxide film on the surface;nThe process of supplying a second inorganic material to the aforementioned substrate to modify the surface of the aforementioned first film; andnFor the substrate, a deposition gas is supplied to selectively grow the thin film on the surface of the second film. |