abstract |
The present invention provides an oxide sintered body used in a sputtering target material that has a high film formation rate and can obtain a high refractive index film without splashing from the surface of the target material even during high-power film formation. In an oxide sintered body having zinc, niobium, aluminum, and oxygen as constituent elements, the following oxide sintered body is used: When the contents of zinc, niobium, and aluminum are set to Zn, Nb, and Al, respectively, Nb/(Zn+ Nb+Al)=0.076~0.289nn n n Al/(Zn+Nb+Al)=0.006~0.031. |