| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_2baf849d216e689ecc40ccc931a7a7bc |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G77-28
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G77-18
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G77-16
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G77-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G77-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G77-50 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-16
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0274
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0332
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0337
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31055
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B05D7-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-38
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D183-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D183-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D183-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02126
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02211
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02282 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-40
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B05D7-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-312 |
| filingDate |
2017-02-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2020-10-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_97443f8ad106af852b084bfe4d89daf3
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8529fc3bf24dd625209a00f48008e9a8
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c6dedb2bfd6b34c51908678e6ad554b2 |
| publicationDate |
2020-10-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-I707400-B |
| titleOfInvention |
Method for planarizing semiconductor substrate using silicon-containing composition |
| abstract |
The present invention provides a method for flatly coating a semiconductor substrate using a silicon-containing composition.nn n n A method for manufacturing a polysiloxane-coated substrate is achieved by: coating a first coating polysiloxane composition containing a first coating polysiloxane on a terraced substrate and firing The first step of making the first polysiloxane coating film, and coating the first polysiloxane coating film with a second coating polysilicon that is different from the first coating polysiloxane The polysiloxane composition for the second coating of oxane is fired to form a second polysiloxane coating film. The method for manufacturing a polysiloxane-coated substrate produced in the second step, the second polysiloxane The iso-dense bias (Iso-dense bias) of the alkane coating film is less than 50nm. The first coating polysiloxane contains the hydrolysis condensate of the hydrolyzable silane raw material, and the hydrolyzable silane raw material is 0~ The ratio of 50 mol% includes the first hydrolyzable silane with 4 hydrolyzable groups per molecule,nThe polysiloxane for the second coating contains silanol groups at a ratio of 30 mol% or less with respect to Si atoms, and has a weight average molecular weight of 1,000 to 50,000. |
| priorityDate |
2016-02-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |