http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I703665-B

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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-677
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-48
filingDate 2017-05-11-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2020-09-01-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_08cc70664950b9323ac87a7c17336a8b
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publicationDate 2020-09-01-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber TW-I703665-B
titleOfInvention A vacuum platform with process chambers for removing carbon contaminants and surface oxide from semiconductor substrates
abstract Implementations of the present disclosure generally relate to an improved vacuum processing system. In one implementation, the vacuum processing system includes a first transfer chamber coupling to at least one epitaxy process chamber, a second transfer chamber, a transition station disposed between the first transfer chamber and the second transfer chamber, a first plasma-cleaning chamber coupled to the second transfer chamber for removing oxides from a surface of a substrate, and a load lock chamber coupled to the second transfer chamber. The transition station connects to the first transfer chamber and the second transfer chamber, and the transition station includes a second plasma-cleaning chamber for removing carbon-containing contaminants from the surface of the substrate.
priorityDate 2016-06-03-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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