abstract |
The invention provides a material for forming lithographic underlayer films, comprising at least one of a compound represented by following formula (1) or a resin containing a structural unit derived from the compound represented by following formula (1), n n(in formula (1), R 1 represents a 2n-valent group having 1 to 60 carbon atoms or a single bond; R 2 independently represents a halogen atom, a linear, branched or cyclic alkyl group having 1 to 10 carbon atoms, an aryl group having 6 to 10 carbon atoms, an alkenyl group having 2 to 10 carbon atoms, an alkoxy group having 1 to 30 carbon atoms, a thiol group or a hydroxyl group, and may be the same or different in one and the same naphthyl ring or phenyl ring; n is an integer of 1 to 4, and when n is an integer of 2 or more, the structural formulae in the structural units included in n [ ]’s may be the same or different; x is an oxygen atom, a sulfur atom or does not crosslink; m 2 independently represents an integer of 0 to 7, wherein at least one m 2 is an integer of 1 to 7; q independently represents 0 or 1; provided that at least one of R 1 and R 2 is a group containing an iodine atom). |