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filingDate 2016-08-30-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2020-09-01-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_01c838b401651fdfb93077a0d9a55324
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5e5c5373e96669bd8a8ae017dd242d0f
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publicationDate 2020-09-01-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber TW-I703407-B
titleOfInvention Material for forming lithographic underlayer film, composition for forming lithographic underlayer film, lithographic underlayer film and method for forming the same, and method for forming resist pattern
abstract The invention provides a material for forming lithographic underlayer films, comprising at least one of a compound represented by following formula (1) or a resin containing a structural unit derived from the compound represented by following formula (1), n n(in formula (1), R 1 represents a 2n-valent group having 1 to 60 carbon atoms or a single bond; R 2 independently represents a halogen atom, a linear, branched or cyclic alkyl group having 1 to 10 carbon atoms, an aryl group having 6 to 10 carbon atoms, an alkenyl group having 2 to 10 carbon atoms, an alkoxy group having 1 to 30 carbon atoms, a thiol group or a hydroxyl group, and may be the same or different in one and the same naphthyl ring or phenyl ring; n is an integer of 1 to 4, and when n is an integer of 2 or more, the structural formulae in the structural units included in n [ ]’s may be the same or different; x is an oxygen atom, a sulfur atom or does not crosslink; m 2 independently represents an integer of 0 to 7, wherein at least one m 2 is an integer of 1 to 7; q independently represents 0 or 1; provided that at least one of R 1 and R 2 is a group containing an iodine atom).
priorityDate 2015-08-31-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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