http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I700549-B
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B08B3-10 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B08B3-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-6715 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B08B7-0057 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67051 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B05B1-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-82 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-82 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B08B3-10 |
| filingDate | 2016-08-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2020-08-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7b10b2ff2801520a0fee86cbc92a9730 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_044227b919fe068131de5f9b17f855be |
| publicationDate | 2020-08-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | TW-I700549-B |
| titleOfInvention | Apparatus for the application of a liquid medium exposed to uv-radiation on substrate |
| abstract | The present invention discloses a method for applying liquid medium exposed to UV radiation onnThe device on the substrate has the following components: a housing including an elongated chamber, at least one inlet opening to the chamber, and a slit-shaped outlet opposite to the at least one inlet and extending within the length of the chamber ; A tube extending longitudinally through the chamber, which is at least partially transparent to UV radiation, wherein the tube is arranged in the chamber such that a flow cavity is formed between the tube and the wall of the chamber, which is opposite to the chamber The longitudinal center plane of the discharge port is symmetrical, and the pipe extends into the slit-shaped discharge port in the housing, and wherein two discharge slits extending in the longitudinal direction are formed between the pipe and the housing; and at least one is located in the pipe A UV radiation source, which is adapted to emit UV radiation in a manner directed toward the flow cavity and emitted from the housing through an exhaust port. The device is characterized in that the flow cross section of the flow cavity is reduced from the area adjacent to the at least one inlet to the discharge slit. In this way, the acceleration of the liquid can be realized when the liquid flows toward the discharge slit in practical applications, thereby making the flow uniform. In the area of the discharge slit, a uniform liquid curtain can be formed outside the casing, which can be applied to the substrate. In addition, by reducing the flow cross-section, UV radiation can be evenly delivered into the liquid. |
| priorityDate | 2015-08-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 26.