| abstract |
The present invention provides a positive photosensitive silicone composition, the formed film has high heat resistance, high strength, and high crack resistance, does not produce by-products, can suppress the occurrence of defects, and can be easily and cheaply formed An interlayer insulating film, an active matrix substrate with good transmittance, a display device having the active matrix substrate, and a manufacturing method of the active matrix substrate.nn n n The active matrix substrate 30 is an insulating substrate 10 with a plurality of gate lines 11 extending parallel to each other and a plurality of source lines 12 extending parallel to each other in the crossing direction of the gate lines 11. The lower side of the source line 12 includes the intersection of the gate line 11 and the source line 12 between the interlayer insulating film 14 and the gate insulating film 15. The interlayer insulating film 14 is formed using a positive photosensitive silicone composition without using a photoresist. |