http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I698424-B
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fff37d93db0f039de51e908c77195efe |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01J35-10 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0048 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0382 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-32 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-40 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01J31-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-16 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01J31-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01J35-10 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01J23-44 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C11D11-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-40 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C11D7-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C67-48 |
| filingDate | 2016-07-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2020-07-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8dd797ad0252c9fa541bf8a077564709 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_243b73660feaf50f05eedb4964b1739b |
| publicationDate | 2020-07-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | TW-I698424-B |
| titleOfInvention | Method for producing organic acid ester liquid, and method for producing resist solvent for electronic component manufacturing and rinse liquid for electronic component manufacturing |
| abstract | An objective of this invention is to provide a method capable of producing electronic component precisely, with fewer defective goods and having high yield rate, especially, provide a resist solvent and rinse liquid preferred in respective step of electronic component manufacturing which uses liquid. n n The present invention provides a method for producing organic acid ester liquid, for removing organic peroxide contained in an organic acid ester liquid which is a resist solvent for electronic component manufacturing or organic peroxides contained in an organic acid ester liquid which is a rinse liquid for electronic component manufacturing, wherein, the organic peroxide in the organic acid ester liquid is removed by bringing the organic acid ester liquid into contact with a platinum group metal catalyst. The present also provides a resist solvent or a rinse liquid for electronic component manufacturing obtained by using the aforesaid producing method to remove organic peroxides contained in the organic acid ester liquid, which has a peroxide value (POV) of 2mmol/kg or less. |
| priorityDate | 2015-07-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 133.