http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I695227-B
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_356068227e13eed6ff524f07808e0bf7 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-18 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 |
| filingDate | 2019-05-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2020-06-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_32f90d4b3b188706e81cadd53f8e99ff http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2662d6e283c9f031d9a8356291c015bd http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6bd9e75853486621c4abaca76555701c http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_25f01fe3350196aba1c52d54673ee0db |
| publicationDate | 2020-06-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | TW-I695227-B |
| titleOfInvention | Chemically enhanced positive photoresist composition for improved pattern outline |
| abstract | The invention relates to a photoresist composition for KrF laser by adding a resin that can increase transmittance, which can achieve a vertical profile compared to the existing KrF positive photoresist, and the invention is used for patterns The contour-improved forward photoresist composition, relative to the total weight of the photoresist composition, may include: 5 to 60% by weight of a polymer resin, and 0.1 to 10% by weight of a transmittance-enhancing resin represented by Chemical Formula 1 Additives, 1 to 10% by weight of crosslinking agent, 0.05 to 10% by weight of photo acid generator, 0.01 to 5% by weight of acid diffusion preventing agent, and the remaining solvents. Through the present invention, the technical effect of a composition having a vertical profile, improved sensitivity, and an excellent process margin can be obtained compared with the existing positive photoresist. |
| priorityDate | 2018-06-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 111.