| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_bce787970b69aeb08d159e7c101c9ed7 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B33Y80-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B24B37-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B24B37-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B24B37-22
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B24B37-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B24D18-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-30625
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B32B3-10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B32B27-00 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B37-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-306 |
| filingDate |
2016-10-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2020-05-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d351248c1cacf55a0e21b84106ba9ee4
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fbed42c249a7603ed024e4711f5aad1b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6d26df416f8d0a44c8abc6f52da13e7a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4e8ac1b27391b01f55fcad1a4ee87f81
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e2b78423c7c81befb95b6447be6762d9
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_31c971de54ab8eb8b21d7a765a2a3abe |
| publicationDate |
2020-05-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-I692386-B |
| titleOfInvention |
Apparatus and method for forming polished objects with desired boundary potential |
| abstract |
Implementations described herein generally relate to polishing articles and methods of manufacturing polishing articles used in polishing processes and cleaning processes. More particularly, implementations disclosed herein relate to composite polishing articles having graded properties. In one implementation, a polishing article is provided. The polishing article comprises one or more exposed first regions formed from a first material and having a first zeta potential and one or more second exposed regions formed from a second material and having a second zeta potential, wherein the first zeta potential is different from the second zeta potential. |
| priorityDate |
2015-10-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |