http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I691520-B
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_85acb82505c45f77e9aae281fe2cd8f9 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02B5-22 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02B5-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-032 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G59-42 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G59-24 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G59-17 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02B1-04 |
| filingDate | 2015-07-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2020-04-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b8fece4eb148222cdf8262f4b1cb3f30 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d485aec92f07ae822e1007e10ac7002d |
| publicationDate | 2020-04-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | TW-I691520-B |
| titleOfInvention | Method for manufacturing photosensitive resin composition for color filter and photosensitive resin composition for color filter |
| abstract | An objective of this invention is to provide a method for producing photosensitive resin composition for color filter, wherein the photosensitive resin composition for color filter enabling high-fineness photolithography after pigment being dispersed at high concentration, and difficult to generate defects owing to the exist of impurities. n n Provided is a method for producing photosensitive resin composition for color filter, which comprises the following steps: a first step of dispersing a (C) pigment dispersed in a dispersed medium so as to have an average particle size of 50 nm or less, the dispersed medium comprising (A) a compound obtained by reacting a cyclic acid anhydride with a hydroxyl-containing compound, which is obtained by reacting a biphenyl fluorene epoxy compound with a carboxylic acid containing an ethylic unsaturated bonding group, (B) a dispersant, and (Z) a solvent; a second step of formulating (D) a polymeric monomer including at least one ethylic unsaturated bond and (E) a photopolymerization initiator in the dispersion solution obtained by the first step; and a third step of filtering the dispersion solution obtained by the second step with a filtering fineness smaller than the film thickness of a cured film formed of the dispersion solution. |
| priorityDate | 2014-07-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 123.