| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_33c922e05f6133b7d72dbb849d77487d |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F2438-03 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-028
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-033
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-18
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-28
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L23-48
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F8-34
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C25D5-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C25D7-12 |
| filingDate |
2018-11-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2020-04-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f8b7a87d0e8d1ff5963a6da5bd8eb697
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d4da59697e07ea225d86bf7821dbcaf4
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a3d0e33716590a09f74d630af6e67a9c |
| publicationDate |
2020-04-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-I691517-B |
| titleOfInvention |
Photoresist composition and photoresist film using the same |
| abstract |
The present invention relates to a photoresist composition capable of nforming a pattern in which a footing phenomenon is suppressed while being highly sensitive during formation of a fine pattern on a metal surface substrate, and of producing a photoresist film that is excellent in chemical stability, and a photoresist film using the same. The photoresist composition comprises a first (meth)acrylic resin containing a (meth)acrylic backbone and a functional group nrepresented by the following Chemical Formula 1 bonded to one end of the backbone, and a second (meth)acrylic resin containing a (meth)acrylic backbone and a thiol group bonded to one end of the backbone: n nIn Chemical Formula 1, the definition of each substituents is the same as in detail description. |
| priorityDate |
2017-11-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |